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Intel Foundry has received and assembled the industry’s first High Numerical Aperture (High NA) Extreme Ultraviolet (EUV) lithography system, a next-generation lithography system developed…
Intel celebrated first light from a new extreme ultraviolet (EUV) lithography system at its Fab 34 site in Leixlip, Ireland. The EUV scanner, which…
Intel outlined its path toward more than 10x interconnect density improvement in packaging with hybrid bonding, 30% to 50% area improvement in transistor scaling,…
Intel unveiled RibbonFET, its first new transistor architecture in more than a decade, and PowerVia, a new backside power delivery method. In a webcast…
Gigaphoton announced mass production and shipment of its ArF immersion “GT66A” light source, which is based on its state-of-the-art semiconductor lithography manufacturing. The new…
Netherlands-based ASML, a leading provider of lithography systems for the semiconductor industry, agreed to acquire Taiwan-based Hermes Microvision, a leading supplier of pattern verification…
Intel has entered into a strategic pact with ASML targeting next generation silicon manufacturing technologies. Among the agreements, Intel commits EUR829 million (approximately $1.0…
The Defense Advanced Research Projects Agency (DARPA) selected Lucent Technologies to develop an advanced microsystem that will make the design, engineering and fabrication of…
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